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Hot Press FurnaceHot Pressing Furnace
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100-1200.C

Detachable Hot Press Furnace

Digital Display Rotational Viscometer
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Battery R&D

Digital Display Rotational Viscometer

Recirculating ChillerRecirculating Chiller(ZYLAB)
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Chemistry

DL Series Recirculating Chiller( Temperature range -30-5℃)

Lab Reactor with Dosing System10L Double-wall Glass Reactor(ZYLAB) (6)
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Chemical Synthesis

Double Glass Walled Reactor with Dosing System | Temperature Control | For Lab Synthesis & Catalysis

Dual Furnace PECVD System for Nanowire GrowthDual Furnace PECVD System
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100-1200.C

Dual Furnace PECVD System for Nanowire Growth

Rapid Annealing Slide Furnace
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100-1200.C

Dual Temperature Zone Rapid Annealing Slide Furnace

Sliding PECVD SystemSliding PECVD System (2)
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100-1200.C

Dual-Furnace Sliding PECVD System for High-Precision Nanowire and Thin Film Deposition

Planetary Vacuum MixerDetails of Planetary Vacuum Mixer
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Battery R&D

Dual-Shaft Planetary Vacuum Mixer

Dynamic Temperature Control System(-30℃~200℃)Dynamic Temperature Control System-TCU(-30℃-200℃)
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Chemical Synthesis

Dynamic Temperature Control System(-30℃-200℃)

Rolling Press
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Battery R&D

Electric Rolling Press

ZYLAB Epitaxial Furnace Exhaust Gas PurifierPECVD Furnace and Exhaust Gas Purification System Example
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Chemical Vapour Deposition (CVD)

Epitaxial Furnace Exhaust Gas Purifier

Fast Heating PECVD SystemFast Heating PECVD System for Rapid Thin Film Deposition
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100-1200.C

Fast Heating PECVD System for Rapid Thin Film Deposition