Lab Corrosion-Resistant Ultrasonic Atomizer for AACVD
Introduction
The ZYLAB Lab Corrosion-Resistant Ultrasonic Atomizer is a precision aerosol generation device designed for Aerosol-Assisted Chemical Vapor Deposition (AACVD) systems. It converts liquid precursor solutions into fine and uniform aerosols using high-frequency ultrasonic atomization, enabling stable transport of precursor droplets into a heated reactor or laboratory tube furnace for thin-film deposition.
The atomizer features a high-precision micro-flow liquid delivery system combined with a corrosion-resistant ultrasonic atomization module, making it ideal for handling a wide range of chemical precursor solutions, including non-volatile materials. It is widely used in thin-film research, nanomaterial synthesis, functional coatings, and advanced material development.
Key Features
- Designed for AACVD Systems
- Specifically developed as an aerosol generator for Aerosol-Assisted Chemical Vapor Deposition.
- Corrosion-Resistant Construction
- Wetted components are manufactured from chemically resistant materials, suitable for acidic, alkaline, and organic precursor solutions.
- High-Precision Liquid Delivery
- Integrated micro-flow pump provides accurate and stable precursor feeding.
- Uniform Ultrasonic Atomization
- Produces fine aerosol droplets with consistent particle size distribution, improving deposition uniformity.
- Supports Non-Volatile Precursors
- Enables the use of liquid precursors with low vapor pressure that cannot be delivered by conventional CVD methods.
- Continuous and Stable Operation
- Designed for long-term laboratory experiments and research applications.
- Easy System Integration
- Compatible with laboratory tube furnaces, CVD reactors, quartz tube systems, and customized AACVD platforms.
System Configuration
The Lab Corrosion-Resistant Ultrasonic Atomizer consists of two integrated modules:
High-Precision Micro-Flow Liquid Delivery System
Accurately controls the flow rate of precursor solutions, ensuring continuous and stable aerosol generation throughout the deposition process.
Ultrasonic Atomization Module
Uses high-frequency ultrasonic vibration to atomize liquid precursors into fine aerosol droplets, which are carried by process gas into the reaction chamber.
Technical Specifications of Ultrasonic Atomizer
| Model | UA-0.36L |
| Features | Infinitely adjustable liquid feed rate, carrier gas, and atomization power |
| Maximum Volume | 360mL |
| Atomization Particle Size | 5–10 μm |
| Dimensions | Length 180 × Depth 210 × Height 260 mm |
| Solution Injection Method | Variable-speed peristaltic pump |
| Adjustable Liquid Injection Range | 0.04–13 mL/min; memory retention for flow rate, infinitely variable |
| Atomization Power | 35W, infinitely adjustable |
| Liquid Tank Material | PTFE |
| Safety Protection | Non-contact low-liquid-level cutoff |
| Carrier Gas Control | Adjustable float flow rate 60–600 mL/min |
| Services | 12-month warranty with lifetime support |
Applications
The ultrasonic atomizer is suitable for a variety of laboratory research applications, including:
- Aerosol-Assisted Chemical Vapor Deposition (AACVD)
- Thin-film deposition
- ZnO transparent conductive films
- Fuel cell material preparation
- Nanomaterial synthesis
- Electrode material coating
- Composite electrode fabrication
- Functional oxide coatings
- Semiconductor material research
- Battery material research
- Catalyst preparation
- Surface modification
Compatible Equipment
The Lab Corrosion-Resistant Ultrasonic Atomizer can be integrated with:
- Laboratory tube furnaces
- Horizontal tube furnaces
- Multi-zone tube furnaces
- Quartz tube reactors
- CVD systems
- Customized AACVD deposition systems
- Laboratory gas supply systems
For Options on Furnaces
Please visit our website [High Temperature Furnaces Collection]
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