Multi-Zone High Temperature Quartz Tube Annealing Furnace for Wafer Processing

ZYLAB Multi-Zone High Temperature Quartz Tube Annealing Furnace

Introduction

The ZYLAB Multi-Zone High Temperature Quartz Tube Annealing Furnace for semiconductor wafer annealing, thin film heat treatment, and advanced materials research. Equipped with a 200 mm diameter high-purity quartz tube and three independently controlled heating zones, this furnace ensures excellent temperature uniformity and precise thermal control for demanding wafer processing applications.

With intelligent PID self-tuning fuzzy control, high vacuum capability, and a user-friendly 7-inch touchscreen control system, this quartz tube annealing furnace delivers reliable and repeatable performance for laboratories, universities, and semiconductor production environments.

This system is ideal for processes requiring precise temperature profiles, controlled atmospheres, or vacuum conditions.

Key Features

1. High-Purity Quartz Tube for Clean Processing

The furnace is equipped with a high-purity quartz tube (φ200 mm), ensuring minimal contamination during high-temperature wafer annealing and semiconductor processing.

2. Three Independent Multi-Zone Temperature Control

Three individually controlled heating zones allow precise creation of uniform or gradient temperature profiles, making it ideal for:

• Semiconductor wafer annealing

• Thin film annealing

• Diffusion processes

• Materials research

3. High Precision PID Temperature Control

Advanced PID self-learning fuzzy control system provides excellent temperature stability and accuracy within ±1°C, ensuring consistent and repeatable results.

4. High Vacuum Capability

The furnace supports vacuum operation with an ultimate vacuum level of 10 Pa, suitable for vacuum annealing and controlled atmosphere processing.

5. User-Friendly 7-inch Touchscreen Interface

The integrated 7-inch touchscreen control panel provides intuitive operation, programmable temperature profiles, and real-time monitoring.

6. Reliable and Durable Heating System

High-quality Fe-Cr-Al alloy heating elements provide:

• Long service life

• Stable heating performance

• High temperature capability up to 1150°C

Applications of High Temperature Quartz Tube Annealing Furnace

• Semiconductor wafer annealing

• Silicon wafer thermal processing

• Thin film annealing

• Diffusion and oxidation processes

• Semiconductor material research

• Nanomaterials heat treatment

• Electronic materials processing

• University and research laboratory applications

Technical Specifications of High Temperature Quartz Tube Annealing Furnace

Model	O1200-200
Power Supply	Three-phase 380V, 50Hz
Rated Power	20 kW
Heating Element	High-quality Fe-Cr-Al alloy wire
Temperature Accuracy	±1°C
Temperature Sensor Type	K-type thermocouple
Maximum Temperature (Tmax)	1150°C
Long-term Operating Temperature	300~1150°C
Heating Zone Dimensions	φ200 × (300+400+300) mm
Tube Material	High-purity quartz tube
Furnace Dimensions (L×D×H)	2000 × 770 × 1300 mm
Heating Rate	1°C/H – 20°C/Min
Ultimate Vacuum	10 Pa
Weight	Approx. 400 kg
Sealing System
Heating Chamber
Gas Flow Control (Dual Float Flow Meters)

For More Content

Please read our blog: Analysis of Tube Furnace: Applications, Advantages, and Operations

For More Options on Tube Furnaces

Please visit our website [Tube Furnaces]

For More Options on High Temperature Furnaces

Please visit our website [High Temperature Furnaces Collection]