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1600.C Programmable Muffle FurnaceProgrammable Muffle Furnace
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800-1700.C

Continuing Operating Temperature 1600.C Programmable Muffle Furnace Along All Standard Accessories

1600.C Programmable Tube Furnace1600.C Tube Furnace
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800-1700.C

Continuing Operating Temperature 1600.C Programmable Tube Furnace Along All Standard Accessories

Quartz Wafer SupportQuartz Wafer Holder
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Accessories

Custom Quartz Wafer Holder for Wafer Processing

Box FurnaceBox Furnace with Atmosphere Control System
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800-1700.C

Customized 1700.C Box Furnace with Atmosphere Control System

Hot Press FurnaceHot Pressing Furnace
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100-1200.C

Detachable Hot Press Furnace

Dual Furnace PECVD System for Nanowire GrowthDual Furnace PECVD System
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100-1200.C

Dual Furnace PECVD System for Nanowire Growth

Sliding PECVD SystemSliding PECVD System (2)
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100-1200.C

Dual-Furnace Sliding PECVD System for High-Precision Nanowire and Thin Film Deposition

ZYLAB Epitaxial Furnace Exhaust Gas PurifierPECVD Furnace and Exhaust Gas Purification System Example
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Chemical Vapour Deposition (CVD)

Epitaxial Furnace Exhaust Gas Purifier

Fast Heating PECVD SystemFast Heating PECVD System for Rapid Thin Film Deposition
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100-1200.C

Fast Heating PECVD System for Rapid Thin Film Deposition

Five-Temperature Zone CVD FurnaceFive-Temperature Zone CVD Furnace (3)
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100-1200.C

Five-Temperature Zone CVD Furnace

High Purity Alumina Planetary Milling Jar for Laboratory GrindingHigh Strength Alumina Milling Jar for Planetary Ball Mill
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Battery R&D

High Purity Alumina Planetary Milling Jar for Laboratory Grinding

36L 1700.C Chamber Furnace1700.C Muffle Furnace (3)
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800-1700.C

High Temperature 36L 1700.C Chamber Furnace

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