Ultrasonic Atomization Pyrolysis CVD System

Ultrasonic Atomization Pyrolysis CVD System

The ZYLAB Ultrasonic Atomization Pyrolysis CVD System is an advanced thin-film deposition equipment that integrates ultrasonic atomization with chemical vapor deposition (CVD) technology. It employs ultrasonic waves to atomize liquid precursor solutions into uniform micro- or sub-micron droplets, which are then transported by carrier gas into a high-temperature reaction zone. On the substrate surface, the droplets undergo pyrolysis or chemical reactions to form high-quality solid thin films.

This technology is particularly suitable for material systems where high-purity gaseous precursors are difficult to obtain or prohibitively expensive. It represents a significant upgrade over conventional CVD and spray pyrolysis methods.

Description
SPECIFICATIONS

ZYLAB Ultrasonic Atomization Pyrolysis CVD System

Overview:

Key Features:

Wide Range of Precursor Sources & Low Cost
The system can utilize inexpensive and readily available liquid metal salt solutions (e.g., nitrates, chlorides, acetates), avoiding costly and hazardous metal-organic gas precursors.
Precise Composition Control
Multiple precursor solutions can be mixed in controlled ratios for ultrasonic atomization, enabling precise doping and composition regulation for multicomponent thin films, such as perovskites or ternary cathode materials.
Excellent Film Uniformity
Ultrasonic atomization produces fine droplets with narrow size distribution and uniform concentration, resulting in films with consistent thickness and composition.
Large Deposition Area
The system supports large-area uniform deposition, making it ideal for roll-to-roll continuous production processes.
Relatively Low Operating Temperature
Compared with conventional CVD, certain materials (e.g., FTO) can be deposited at lower temperatures (450–550°C), reducing thermal stress on substrates.
Capability to Fabricate Complex Morphologies
By adjusting process parameters such as solution concentration, flow rate, and temperature, the system can control thin-film microstructures, including dense, porous, and nanoparticle-based films.
Environmentally Friendly
The system avoids the use of highly toxic metal-organic precursors, and solvents can be recovered and reused, making the process greener and safer.

Technical Parameters of Ultrasonic Atomization Pyrolysis CVD System:

Component	Parameter	Specification
Ultrasonic Atomizer	Device Name	Corrosion-Resistant Ultrasonic Atomizer
	Power Supply	Single Phase 220V 50Hz
	Rated Power	55 W (Atomizer: 35 W, Peristaltic Pump: 20 W)
	Rated Flow Rate	9 ml/min
	Peristaltic Pump Head Model	WP110
	Peristaltic Pump Tube Size	φ2 mm (ID) × 1 mm (Wall Thickness)
	Rotameter (Float Flow Meter)	0.5–8 L/min
	Solution Tank Capacity	160 ml
	Atomized Droplet Size	5–10 μm
	Atomization Frequency	2.4 MHz
	Device Dimensions (with Metal Rail & Base)	800 mm (L) × 390 mm (H) × 280 mm (D)
	Device Weight (with Metal Rail & Base)	~10 kg
Mini Tube Furnace	Device Name	Mini Tube Furnace
	Model	O1200-50
	Power Supply	220V/50Hz
	Rated Power	1.2 kW
	Maximum Temperature	1200℃
	Rated Temperature	1150℃
	Furnace Chamber	Φ80 × 200 mm
	Device Dimensions	920 mm (L) × 460 mm (H) × 360 mm (D)
	Sensor Type	K-type Thermocouple
	Recommended Heating Rate	10℃/min
	Compatible Furnace Tube Sizes	Φ25 × 600 mm, Φ50 × 600 mm
	Device Weight	~23 kg
	Control System	1. 15 programmable temperature curves 2. 7-inch full-color touch screen 3. Non-linear temperature correction 4. over-temperature alarm, thermocouple failure warning, leakage protection
	Temperature Accuracy	±1℃
	Service & Warranty	One-year limited warranty with lifetime support (consumable parts such as processing tubes and O-rings are not covered under warranty and should be ordered separately under related products).